JPH0123137Y2 - - Google Patents
Info
- Publication number
- JPH0123137Y2 JPH0123137Y2 JP1985050919U JP5091985U JPH0123137Y2 JP H0123137 Y2 JPH0123137 Y2 JP H0123137Y2 JP 1985050919 U JP1985050919 U JP 1985050919U JP 5091985 U JP5091985 U JP 5091985U JP H0123137 Y2 JPH0123137 Y2 JP H0123137Y2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- protection device
- adhesive layer
- support frame
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012790 adhesive layer Substances 0.000 claims description 20
- 239000010409 thin film Substances 0.000 claims description 15
- 239000000853 adhesive Substances 0.000 claims description 9
- 230000001070 adhesive effect Effects 0.000 claims description 9
- 239000010410 layer Substances 0.000 claims description 8
- 238000009423 ventilation Methods 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 description 17
- 239000010408 film Substances 0.000 description 15
- 239000002184 metal Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920000544 Gore-Tex Polymers 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- UGZICOVULPINFH-UHFFFAOYSA-N acetic acid;butanoic acid Chemical compound CC(O)=O.CCCC(O)=O UGZICOVULPINFH-UHFFFAOYSA-N 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985050919U JPH0123137Y2 (en]) | 1985-04-05 | 1985-04-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985050919U JPH0123137Y2 (en]) | 1985-04-05 | 1985-04-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61167652U JPS61167652U (en]) | 1986-10-17 |
JPH0123137Y2 true JPH0123137Y2 (en]) | 1989-07-17 |
Family
ID=30569500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985050919U Expired JPH0123137Y2 (en]) | 1985-04-05 | 1985-04-05 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0123137Y2 (en]) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990045743A (ko) * | 1996-07-17 | 1999-06-25 | 사또 아끼오 | 마스크 보호 장치 |
JP2001005169A (ja) * | 1999-06-24 | 2001-01-12 | Shin Etsu Chem Co Ltd | ペリクルおよびペリクルの製造方法 |
JP2006184817A (ja) * | 2004-12-28 | 2006-07-13 | Fujitsu Ltd | ペリクル及び転写基板 |
EP4286941A3 (en) * | 2014-11-17 | 2024-03-06 | ASML Netherlands B.V. | Pellicle attachment apparatus |
-
1985
- 1985-04-05 JP JP1985050919U patent/JPH0123137Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS61167652U (en]) | 1986-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4737387A (en) | Removable pellicle and method | |
EP2267529B1 (en) | Pellicle | |
JP2001133960A (ja) | リソグラフィー用ペリクル及びペリクルの使用方法 | |
KR0164946B1 (ko) | 마스크 보호장치 | |
US6192100B1 (en) | X-ray mask pellicles and their attachment in semiconductor manufacturing | |
JPH0123137Y2 (en]) | ||
JPH01292343A (ja) | ペリクル | |
US20020142234A1 (en) | Photomask | |
JPS6339703Y2 (en]) | ||
US6340541B1 (en) | Mask for recycling and fabrication method thereof | |
JP4343775B2 (ja) | ペリクルフレーム及びフォトリソグラフィー用ペリクル | |
JPS638899Y2 (en]) | ||
JPS6232463A (ja) | 露光用マスク | |
JP7533659B2 (ja) | ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法及び半導体の製造方法 | |
JPH0513370Y2 (en]) | ||
JPH0519452A (ja) | ペリクル及びその装着方法 | |
JP3108865U (ja) | 露光用フォトマスク | |
JPH1184633A (ja) | 感光性樹脂版の製造方法及び装置 | |
JPH06273921A (ja) | マスク保護用ペリクル | |
JPH1115140A (ja) | フォトマスク | |
JPH0419543Y2 (en]) | ||
JPH0238282Y2 (en]) | ||
JP3041760U (ja) | 大型ペリクル | |
JPS63309954A (ja) | 半導体装置製造用マスク | |
JPS626714Y2 (en]) |